The MA6 mask aligner was designed to pattern parts of thin films using optical lithography. It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical "photoresist", or simply "resist," on the substrate. 

The Karl Suss MA6 is one of the most reliable mask aligners in the industry with a minimal maintenance cost. It works with substrates up to 150mm in diameter. The exposure wavelength is UV400 (range 350- 450 nm). Two exposure intensity channels are supplied over which the user can vary the exposure time for proper image sharpness. 

A Bottom Side Alignment option allows patterning on both sides of the substrate. 

Automatic wedge compensation can be used to ensure that the mask and the wafer are parallel. Z-axis is motorized, and the gap between mask and wafer is programmable from 0 to 300 microns. 

Several contact modes are available, for which the space resolution is as following:

Training information

• 2-4 hours training, depends on customer needs. 
• No Prerequisites. Verbal explanation & SOP on MA6 operation principles: safety, turn on/off, microscope operation, operator menu, front side / back side alignment. Trainee’s hands-on under my supervision.